氯化钠衬底(NaCl)

描述

氯化钠(NaCl)衬底

氯化钠(NaCl)是一种无色透明的立方晶系晶体。作为一种可溶于水且极易潮解的材料,它无法进行化学抛光处理。NaCl衬底常用于红外透射窗口和傅里叶变换红外光谱仪(FTIR),也是CO₂激光器应用中的可靠光学材料选择。


氯化钠衬底物理性能

性能 参数
材料 NaCl
生长方法 晶体生长法
晶体结构 M3
晶格常数 (Å) a = 5.642
熔点 801°C
密度 (g/cm³) 2.16
波长范围 0.25 – 22.0 µm
折射率 1.54427
透过率 0.9
Nf 值 0.0127

规格参数

  • 可选尺寸:10×10 mm、20×20 mm、30×30 mm、直径 50 mm(可按需定制)

  • 厚度:2.0 mm、3.0 mm、5.0 mm

  • 晶向:<100>、<110>、<111>

  • 表面粗糙度 (Ra):< 20 nm


包装信息

苏州科跃生产的NaCl衬底在Class 1000级洁净室中加工,并采用Class 100洁净袋或晶圆盒封装,确保储存和运输过程中的纯净度与防潮性能。

评价

目前还没有评价

成为第一个“氯化钠衬底(NaCl)” 的评价者

您的邮箱地址不会被公开。 必填项已用 * 标注

常见问题

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.