氧化铝坩埚

基本信息(Short Description)

  • 产品名称:氧化铝坩埚

  • 英文名称:Alumina Crucible

  • 材质:高纯氧化铝(Al₂O₃ ≥ 99% / 99.5% / 99.8% / 99.99%)

  • 熔点:约 2050°C

  • 工作温度:最高可达 1800°C(气氛不同略有差异)

  • 密度:3.8 ~ 3.95 g/cm³

  • 常规形状:圆柱形、锥形、船形、矩形、带盖或带嘴

  • 应用领域:高温材料分析、粉末烧结、金属冶炼、灰分分析、实验室热处理等

描述

详细描述(Description)

苏州科跃材料科技有限公司提供的氧化铝坩埚采用高纯 Al₂O₃ 陶瓷经高温烧结制成,具有优异的耐高温性能、化学稳定性和机械强度,是各种热处理、熔融和高温实验中最常用的坩埚之一。

氧化铝坩埚广泛应用于科研院所、冶金实验、材料开发、陶瓷与玻璃行业中,特别适用于需要高纯环境和热稳定性的工艺。


产品特点

  • 高纯度选择多样:可选 99%、99.5%、99.8%、99.99% 等纯度等级,满足不同应用需求;

  • 优良的热稳定性:在高温条件下仍能保持结构稳定,不易变形或破裂;

  • 良好的抗化学腐蚀性:耐多数酸碱和金属熔液腐蚀,适用于严苛环境;

  • 高机械强度与抗热震性:适应快速升温或冷却操作,适合频繁实验条件;

  • 绝缘性能强:是良好的电绝缘体,常用于高温电炉等电热系统。


典型应用场景

  1. 高温烧结实验:如陶瓷粉末、锂电池材料、功能氧化物的高温处理;

  2. 灰分与挥发分测定:用于煤炭、水泥、矿物等物质的残渣分析;

  3. 金属熔炼:适用于铝、镁、锌等低熔点金属的熔化试验;

  4. 玻璃和搪瓷实验:在制备特殊玻璃或釉料的熔融与合成中;

  5. 化学分析容器:进行各种无机、有机高温化学反应的承载容器;

  6. 等离子喷涂与PVD蒸发托盘:部分规格可定制用于热蒸发工艺。


常规尺寸规格(可定制)

容量(mL) 顶部直径(mm) 高度(mm) 壁厚(mm) 类型
10 20 25 2.5 圆柱形
30 35 35 3.0 圆柱形
50 40 40 3.0 锥形
100 50 50 3.5 船形
200 65 70 4.0 圆柱带盖
定制 根据图纸 根据图纸 ≥2.0 按需

注:可根据用户需求定制特殊尺寸、带嘴坩埚、通气孔坩埚、带盖坩埚、带托座坩埚等结构。


包装与交付

每个氧化铝坩埚在出厂前均经过清洗与干燥处理,采用防震泡棉与密封袋独立包装,再以纸箱或木箱外封确保运输安全。可提供材质检测报告(XRD、ICP-OES、SEM)与RoHS声明。

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常见问题

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.